High Res Microscopy Star Targets consist of 5 Siemens stars and show the peculiarity that the tapered segments in the center of the stars are precisely manufactured to a minimum width of 150nm. This target also features 5 pinholes with diameters between 4.0-0.25μm, which allows for detailed characterization of micro-imaging optics. High Res Microscopy USAF Targets easily determine the resolution limit of an objective in transmitted light and consists of 59 line patterns with 7.5 to 3300 lp/mm in horizontal and vertical alignment. The negative patterns on each target allow the structures to be transparent, while the background is blocked by a chrome layer. High Resolution Microscopy Slide Targets provide excellent dimensional stability and are mounted in a metal microscope slide holder. By removing the chromium layer, patterns are created in sizes down to 100nm. The patterns are etched on a 10 × 10mm² fused silica substrate with broad spectral transmission (DUV-VIS-NIR), on which a chromium layer of high optical density is applied. High Resolution Microscopy Slide Targets are designed using high-precision e-beam lithography.

High resolution siemens star